1. Principles of plasma discharges and materials processing
Author: Lieberman, Michael A
Library: Library of College of Science University of Tehran (Tehran)
Subject: ، Plasma dynamics,، Thin films -- Surfaces,، Plasma etching,، Plasma chemistry
Classification :
QC
718
.
5
.
D9
L54
1994
2. Principles of plasma discharges and materials processing
Author: / Michael A. Lieberman, Allan J. Lichtenberg
Library: Central Library, Center of Documentation and Supply of Scientific Resources (East Azarbaijan)
Subject: Plasma dynamics,Thin films, Surfaces,Plasma etching,Plasma chemistry
Classification :
QC718
.
5
.
D9L54
1994
3. Principles of plasma discharges and materials processing
Author: / Michael A. Lieberman, Allan J. Lichtenberg
Library: Central Library and Information Center of the University of Mohaghegh Ardabili (Ardabil)
Subject: Plasma dynamics,Thin films, Surfaces,Plasma etching,Plasma chemistry, Industrial applications
Classification :
QC718
.
5
.
D9L54
2005
4. Principles of plasma discharges and materials processing]CD[
Author: Lieberman, M. A. ) Michael A.(, Michael A. Lieberman, Allan J. Lichtenberg
Library: Library and Documentation Center of Kurdistan University (Kurdistan)
Subject: ، Plasma dynamics,Surfaces ، Thin films,، Plasma etching,، Plasma chemistry
Classification :
QC718
.
5
.
D9
L54
]
CD
[
5. Principles of plasma discharges and materials processing
پدیدآورنده : Lieberman, M. A.) Michael A.(
موضوع : ، Plasma dynamics,، Thin films-- Surfaces,، Plasma etching,، Plasma chemistry
۳ نسخه از این کتاب در ۲ کتابخانه موجود است.
6. Principles of plasma discharges and materials processing
Author: / Michael A. Lieberman, Allan J. Lichtenberg
Library: Central Library and Documents Center of Mazandaran University (Mazandaran)
Subject: Plasma dynamics,Thin films- Surfaces,Plasma etching,Plasma chemistry- Industrial applications
Classification :
QC718
.
5
.
D9
,
L54
2005
7. Principles of plasma discharges and materials processing
Author: / Michael A. Lieberman, Allan J. Lichtenberg
Library: Central Library, Center of Documentation and Supply of Scientific Resources (East Azarbaijan)
Subject: Plasma dynamics,Thin films- Surfaces,Plasma etching,Plasma chemistry- Industrial applications
Classification :
QC718
.
5
.
D9L54
2005
8. Principles of plasma discharges and materials processing
Author: / Michael A. Lieberman and Allan J. Lichtenberg
Library: Library of Campus2 Colleges of Engineering of Tehran University (Tehran)
Subject: Plasma dynamics,Thin films ــ Surfaces.,Plasma etching ــ Surfaces.,Plasma chemistry ــ Industrial applications.
Classification :
QC
718
.
5
.
D9L54
2005
9. Principles of plasma discharges and materials processing
Author: Lieberman, M. A. )Michael A.(
Library: Central Library and Documents Center of Industrial University of Khaje Nasiredin Toosi (Tehran)
Subject: ، Plasma dynamics,Surfaces ، Thin films,، Plasma etching,Industrial applications ، Plasma chemistry
Classification :
QC
718
.
5
.
D9
L54
2005
10. Principles of plasma discharges and materials processing
Author: Lieberman, Michael A.
Library: Library of Institute for Research in Fundamental Sciences (Tehran)
Subject: ، Plasma dynamics,Surfaces ، Thin films,، Plasma etching,Industrial applications ، Plasma chemistry
Classification :
QC
718
.
5
.
D9L53
2005
